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Next generation of international chemical additives : a critical review of current US patents /

DeRosa, Thomas F.

Next generation of international chemical additives : a critical review of current US patents / Thomas F. DeRosa - Amsterdam : Elsevier, 2012 - xi,565 p. : ill. , ; 24 cm.

Includes index

ISBN: 9780444537881 0444537880

Subjects--Topical Terms:
Chemicals--Patents
Materials--Additives

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