Hübner, René <br/><br/>
Advanced Ta-based diffusion barriers for Cu interconnects  [electronic resource] / 
René Hübner 
 - New York :  Nova Science Publishers,  c2009 
 - 1 online resource (xvi, 366 p.) :  ill. 
<br/><br/> Description based on print version record 
<br/><br/>Includes bibliographical references (p. [81]-94) and index 
<br/><br/><br/>Mode of access: Internet 
<br/><br/><label>ISBN: </label>9781607416753 (electronic bk.) 1607416751 (electronic bk.) 9781604564518 (hardcover) 1604564512 (hardcover) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Interconnects (Integrated circuit technology)<br/>Integrated circuits<br/>Electrodiffusion