TY  - BOOK
AU  - Hübner,René
TI  - Advanced Ta-based diffusion barriers for Cu interconnects
SN  - 9781607416753 (electronic bk.)
PY  - 2009///
CY  - New York
PB  - Nova Science Publishers
KW  - Interconnects (Integrated circuit technology)
KW  - Integrated circuits
KW  - Electrodiffusion
N1  - Description based on print version record; Includes bibliographical references (p. [81]-94) and index
UR  - http://www.netlibrary.com.libraryumpsa.idm.oclc.org/urlapi.asp?action=summary&v=1&bookid=281179
ER  -