Eynon, Benjamin G. <br/><br/>
Photomask fabrication technology / 
Benjamin C. Eynon, Jr., Banqiu Wu 
 - New York:   McGraw-Hill,   2005 
 - xi, 571 p.:   ill.;   24 cm. 
<br/><br/>Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>0071445633 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits--Masks<br/>Masks (Electronics)<br/>Microlithography