00800nam a2200241 4500 vtls000009278 KUKTEM 20251117142239.0 060606t2004 xxu gr |0 1 0|eng | 0071445633 201107131741 VLOAD 200908141115 VLOAD 200908141047 VLOAD 200908131547 VLOAD 200606141143 VLOAD UMP TK7872.M3 E96 2005 Eynon, Benjamin G. Photomask fabrication technology / Benjamin C. Eynon, Jr., Banqiu Wu New York: McGraw-Hill, 2005 xi, 571 p.: ill.; 24 cm. Includes bibliographical references and index Integrated circuits Masks Masks (Electronics) Microlithography Wu, Banqiu 0 0 lcc 0 0 20000 20000 2019-09-04 314.74 0 TK7872.M3 E96 2005 0000012516 2019-09-04 00:00:00 314.74 2019-09-04 OPEN 25387 25393