01339nam a2200289 a 4500001001400000003000700014005001700021008004100038020001800079020001500097039004500112040000800157090002200165245018600187260005700373300004500430490006300475504005200538650003900590650003900629650005000668700001700718830006200735952013300797999002700930999009200957vtls000060651KUKTEM20251117145458.0120531t2001    paudao f      001 0 eng d  a9781558995215  a1558995218 9a201304101110bhuday201205310935zsafura  aUMP  aTS654.5 .C44 200100aChemical-Mechanical Polishing 2000 :bfundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A. /ceditors, Rajiv K. Singh ... [et al.]  aWarrendale, PA :bMaterials Research Society,cc2001  a1 v. (various pagings) :bill. ;c24 cm.1 aMaterials Research Society symposium proceedings ;vv. 613  aIncludes bibliographical references and indexes 0aElectrolytic polishingvCongresses 0aGrinding and polishingvCongresses 0aChemical mechanical planarizationvCongresses1 aSingh, R. K. 0aMaterials Research Society symposia proceedings ;vv. 613  00104070a20000b20000d2019-09-04g107.07l0oTS654.5 .C44 2001p0000068169r2019-09-04 00:00:00t1v107.07w2019-09-04yOPEN  aVIRTUA40c47098d47104  aVTLSSORT0080*0200*0201*0400*0900*2450*2600*3000*4900*5040*6500*6501*6502*7000*8300*9992