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  <titleInfo>
    <title>Ion beam processes in advanced electronic materials and device technology</title>
    <subTitle>symposium held April 15-18, 1985, San Francisco, California, U.S.A</subTitle>
  </titleInfo>
  <name type="personal">
    <namePart>Appleton, B. R.</namePart>
  </name>
  <name type="personal">
    <namePart>Eisen, Fred H.</namePart>
  </name>
  <name type="personal">
    <namePart>Sigmon, T. W.</namePart>
  </name>
  <typeOfResource>text</typeOfResource>
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  <originInfo>
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    <place>
      <placeTerm type="text">Pittsburgh, PA</placeTerm>
    </place>
    <publisher>Materials Research Society</publisher>
    <dateIssued>c1985</dateIssued>
    <dateIssued encoding="marc">1985</dateIssued>
    <issuance>monographic</issuance>
  </originInfo>
  <language>
    <languageTerm authority="iso639-2b" type="code">eng</languageTerm>
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  <physicalDescription>
    <form authority="marcform">print</form>
    <extent>xv, 393 p. : ill. ; 24 cm.</extent>
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  <targetAudience authority="marctarget">specialized</targetAudience>
  <note type="statement of responsibility">editors, B. R. Appleton, F. H. Eisen, T. W. Sigmon</note>
  <note>Includes bibliographies references and index</note>
  <subject authority="lcsh">
    <topic>Semiconductors</topic>
    <topic>Congresses</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Ion implantation</topic>
    <topic>Congresses</topic>
  </subject>
  <relatedItem type="series">
    <titleInfo>
      <title>Materials Research Society symposia proceedings</title>
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  <identifier type="isbn">9780931837104</identifier>
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