01295nam a2200289 a 4500001001400000003000700014005001700021008004100038020001800079039004600097040000800143090002400151245020300175260005700378300003300435490006100468504004900529650003100578650003300609700002000642700001900662700001800681830005200699952013500751999002700886999009200913vtls000061812KUKTEM20251117145508.0120613t1985    paua   f b    001 0 eng d  a9780931837104 9a201304021230bjamiey201206131053zsafura  aUMP  aTK7871.85 .I56 198500aIon beam processes in advanced electronic materials and device technology :bsymposium held April 15-18, 1985, San Francisco, California, U.S.A. /ceditors, B. R. Appleton, F. H. Eisen, T. W. Sigmon  aPittsburgh, PA :bMaterials Research Society,cc1985  axv, 393 p. :bill. ;c24 cm.1 aMaterials Research Society symposia proceedings ;vv. 45  aIncludes bibliographies references and index 0aSemiconductorsxCongresses 0aIon implantationxCongresses1 aAppleton, B. R.1 aEisen, Fred H.1 aSigmon, T. W. 0aMaterials Research Society symposia proceedings  00104070a20000b20000d2019-09-04g103.77l0oTK7871.85 .I56 1985p0000071788r2019-09-04 00:00:00t1v103.77w2019-09-04yOPEN  aVIRTUA40c47441d47447  aVTLSSORT0080*0200*0400*0900*2450*2600*3000*4900*5040*6500*6501*7000*7001*7002*8300*9992