Dobkin, Daniel Mark <br/><br/>
Principles of chemical vapor deposition :  what's going on inside the reactor / 
by Daniel M. Dobkin and Michael K. Zuraw 
 - Boston :  Kluwer Academic Publishers,  2003 
 - xi, 273 p. :  ill. ;  25 cm. 
<br/><br/>Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>1402012489 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Vapor-plating<br/>Refractory coating