Ma, Xu <br/><br/>
Computational lithography / 
Xu Ma and Gonzalo R. Arce 
 - Hoboken, N.J. :  Wiley,  c2010 
 - xv, 226 p. :  ill. ;  25 cm. 
 - Wiley series in pure and applied optics .
<br/><br/>Includes bibliographical references (p. 217-222) and index 
<br/><br/><label>ISBN: </label>9780470596975 047059697X 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography--Mathematics<br/>Integrated circuits--Design and construction--Mathematics<br/>Photolithography--Mathematics<br/>Semiconductors--Etching--Mathematics<br/>Resolution (Optics)