01175nam a2200265 a 4500001001400000003000700014005001700021008004100038020001800079020001500097040000800112111001400120245015800134250001100292260005800303300003300361490006300394500019000457504005000647650003900697650003900736650005000775700002100825830006300846vtls000060094KUKTEM20251125093238.0120523t2004    paua   f      001 0 eng d  a9781558997660  a1558997660  aUMP2 aSymposium00aAdvances in chemical-mechanical polishing :bsymposium held April 13-15, 2004, San Francisco, California, U.S.A. /ceditors, Duane S. Boning ... [et al.]  av. 816  aWarrendale, PA. :bMaterials Research Society,cc2004  axi, 292 p. :bill. ;c24 cm.1 aMaterials Research Society symposium proceedings ;vv. 816  a"The papers here were presented at Symposium K, ’Advances in Chemical-Mechanical Polishing,’ held April 13-15 at the 2004 MRS Spring Meeting in San Francisco, California ..."--p. xi  aIncludes bibliographical references and index 0aElectrolytic polishingvCongresses 0aGrinding and polishingvCongresses 0aChemical mechanical planarizationvCongresses1 aBoning, Duane S. 0aMaterials Research Society symposium proceedings ;vv. 816