Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics :  symposium held April 10-12, 2007, San Francisco, California, U.S.A. / 
editors: Qinghuang Lin ... [et al.] 
 - Warrendale, PA :  Materials Research Society,  2007 
 - xiv, 338 p. :  ill. ;  24 cm. 
 - Materials Research Society symposium proceedings ;  v. 990 .
 - Materials Research Society symposia proceedings ;  v. 990 .
<br/><br/>Includes bibliographical references and indexes 
<br/><br/><label>ISBN: </label>9781558999503 1558999507 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Interconnects (Integrated circuit technology)--Congresses<br/>Integrated circuits--Very large scale integration--Congresses<br/>Microelectronics--Congresses<br/>Nanoelectronics--Congresses<br/>Materials--Congresses