DeRosa, Thomas F. <br/><br/>
Next generation of international chemical additives :  a critical review of current US patents / 
Thomas F. DeRosa 
 - Amsterdam :  Elsevier,  2012 
 - xi,565 p. :  ill. , ;  24 cm. 
<br/><br/> Includes index 
<br/><br/><label>ISBN: </label>9780444537881 0444537880 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemicals--Patents<br/>Materials--Additives