<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[ Search for 'su:&quot;Heterostructures.&quot;']]> </title> <link> https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Heterostructures.%22&#38;sort_by=title_dsc&#38;format=rss </link> <atom:link rel="self" type="application/rss+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Heterostructures.%22&#38;sort_by=title_dsc&#38;format=rss"/> <description> <![CDATA[ Search results for 'su:&quot;Heterostructures.&quot;' at ]]> </description> <opensearch:totalResults>12</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>30</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Heterostructures.%22&#38;sort_by=title_dsc&#38;format=opensearchdescription"/> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dsu%253A%2522Heterostructures.%2522" startPage="" /> <item> <title> Silicon heterostructure devices / </title> <dc:identifier>ISBN:9781420066906 | 1420066900</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=48177</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1420066900.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Boca Raton : CRC Press , 2008 .<br /> 1 v. (various pagings) : 27 cm..<br /> 9781420066906 | 1420066900 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=48177">Place hold on <em>Silicon heterostructure devices /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=48177</guid> </item> <item> <title> SiGe and Si strained-layer epitaxy for silicon heterostructure devices / </title> <dc:identifier>ISBN:9781420066852 (alk. paper) | 1420066854 (alk. paper)</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=43980</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1420066854.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Boca Raton : CRC Press/Taylor &amp; Francis, 2008 .<br /> 1 v. (various pagings) : , &quot;The material was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor and Francis, 2005&quot;--T.p. verso. 26 cm..<br /> 9781420066852 (alk. paper) | 1420066854 (alk. paper) </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=43980">Place hold on <em>SiGe and Si strained-layer epitaxy for silicon heterostructure devices /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=43980</guid> </item> <item> <title> Selected works of Professor Herbert Kroemer / </title> <dc:identifier>ISBN:9789812709011 | 9812709010</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=50582</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/9812709010.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Singapore : World Scientific, 2008 .<br /> 376 p. : 27 cm..<br /> 9789812709011 | 9812709010 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=50582">Place hold on <em>Selected works of Professor Herbert Kroemer /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=50582</guid> </item> <item> <title> Physics and chemistry of nanostructured materials / </title> <dc:identifier>ISBN:0748408738</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=29812</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/0748408738.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> London : Taylor and Francis, 2000 .<br /> 241 p. 24 cm.<br /> 0748408738 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=29812">Place hold on <em>Physics and chemistry of nanostructured materials /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=29812</guid> </item> <item> <title> Measurement and modeling of silicon heterostructure devices / </title> <dc:identifier>ISBN:9781420066920 (alk. paper) | 1420066927 (alk. paper)</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49854</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1420066927.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Boca Raton, FL : CRC Press, 2008 .<br /> 1 v. (various pagings) : 27 cm..<br /> 9781420066920 (alk. paper) | 1420066927 (alk. paper) </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=49854">Place hold on <em>Measurement and modeling of silicon heterostructure devices /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49854</guid> </item> <item> <title> Lattice engineering : technology and applications / </title> <dc:identifier>ISBN:9789814316293 (hbk.)</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=80377</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/9814316296.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Singapore : Pan Stanford, 2013 .<br /> xii, 385 p., [4] p. of plates : 24 cm..<br /> 9789814316293 (hbk.) </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=80377">Place hold on <em>Lattice engineering :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=80377</guid> </item> <item> <title> Epitaxial oxide thin films III : symposium held March 31- April 2, 1997, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:9781558993785 | 1558993789</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=65548</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558993789.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, PA : Materials Research Society, 1997 .<br /> xiii, 419 p. : 24 cm..<br /> 9781558993785 | 1558993789 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=65548">Place hold on <em>Epitaxial oxide thin films III :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=65548</guid> </item> <item> <title> Epitaxial oxide thin films II : symposium held November 26-30, 1995, Boston, Massachusetts, U.S.A. / </title> <dc:identifier>ISBN:9781558993044 | 1558993045</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=63302</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558993045.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, Pa. : Materials Research Society, 1996 .<br /> xv, 562 p. : 24 cm..<br /> 9781558993044 | 1558993045 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=63302">Place hold on <em>Epitaxial oxide thin films II :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=63302</guid> </item> <item> <title> Epitaxial oxide thin films and heterostructures : symposium held April 5-7, 1994, San Francisco, California, USA / </title> <dc:identifier>ISBN:9781558992412 | 1558992413</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=63366</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558992413.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, PA : Materials Research Society, 1994 .<br /> xi, 408 p. : 24 cm..<br /> 9781558992412 | 1558992413 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=63366">Place hold on <em>Epitaxial oxide thin films and heterostructures :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=63366</guid> </item> <item> <title> Epitaxial heterostructures : symposium held April 16-19, 1990, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:9781558990876 | 1558990879</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49979</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558990879.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, Pa. : Materials Research Society, 1990 .<br /> xiii, 631 p. : 24 cm..<br /> 9781558990876 | 1558990879 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=49979">Place hold on <em>Epitaxial heterostructures :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49979</guid> </item> <item> <title> Current issues in heteroepitaxial growth-- stress relaxation and self assembly / </title> <dc:identifier>ISBN:9781558996328 | 155899632X</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66947</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/155899632X.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Warrendale, PA : Materials Research Society, 2002 .<br /> xi, 316 p. : 24 cm..<br /> 9781558996328 | 155899632X </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=66947">Place hold on <em>Current issues in heteroepitaxial growth-- stress relaxation and self assembly /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66947</guid> </item> <item> <title> Circuits and applications using silicon heterostructure devices / </title> <dc:identifier>ISBN:9781420066944 (alk. paper) | 1420066943 (alk. paper)</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=39845</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1420066943.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Boca Raton : CRC Press , 2007 .<br /> 1 v. (various pagings) : 27 cm..<br /> 9781420066944 (alk. paper) | 1420066943 (alk. paper) </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=39845">Place hold on <em>Circuits and applications using silicon heterostructure devices /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=39845</guid> </item> </channel> </rss>
