<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[ Search for 'su:&quot;Resolution Optics&quot;']]> </title> <link> https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Resolution%20Optics%22&#38;sort_by=title_dsc&#38;format=rss </link> <atom:link rel="self" type="application/rss+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Resolution%20Optics%22&#38;sort_by=title_dsc&#38;format=rss"/> <description> <![CDATA[ Search results for 'su:&quot;Resolution Optics&quot;' at ]]> </description> <opensearch:totalResults>2</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>30</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Resolution%20Optics%22&#38;sort_by=title_dsc&#38;format=opensearchdescription"/> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dsu%253A%2522Resolution%2520Optics%2522" startPage="" /> <item> <title> Signal and image multiresolution analysis / </title> <dc:identifier>ISBN:9781848212572</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66501</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1848212577.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Hoboken, N.J. : Wiley, 2012 .<br /> xiv, 293 p. : 25 cm..<br /> 9781848212572 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=66501">Place hold on <em>Signal and image multiresolution analysis /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66501</guid> </item> <item> <title> Computational lithography / </title> <dc:identifier>ISBN:9780470596975 | 047059697X</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=59097</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/047059697X.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> By Ma, Xu.<br /> Hoboken, N.J. : Wiley, 2010 .<br /> xv, 226 p. : 25 cm..<br /> 9780470596975 | 047059697X </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=59097">Place hold on <em>Computational lithography /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=59097</guid> </item> </channel> </rss>
