<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[ Search for 'su:&quot;Semiconductor doping.&quot;']]> </title> <link> https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Semiconductor%20doping.%22&#38;sort_by=title_dsc&#38;format=rss </link> <atom:link rel="self" type="application/rss+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Semiconductor%20doping.%22&#38;sort_by=title_dsc&#38;format=rss"/> <description> <![CDATA[ Search results for 'su:&quot;Semiconductor doping.&quot;' at ]]> </description> <opensearch:totalResults>11</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>30</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://efind.ump.edu.my/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22Semiconductor%20doping.%22&#38;sort_by=title_dsc&#38;format=opensearchdescription"/> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dsu%253A%2522Semiconductor%2520doping.%2522" startPage="" /> <item> <title> Silicon technologies : ion implantation and thermal treatment / </title> <dc:identifier>ISBN:9781848212312 | 1848212313</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=59874</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1848212313.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> London : Wiley, 2011 .<br /> xvii, 337 p. : 24 cm..<br /> 9781848212312 | 1848212313 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=59874">Place hold on <em>Silicon technologies :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=59874</guid> </item> <item> <title> Radiation defect engineering / </title> <dc:identifier>ISBN:9812565213</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=31961</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/9812565213.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> By Kozlovski Vitali.<br /> Hackensack, N.J. : World Scientific, 2005 .<br /> 253 p. : 26 cm..<br /> 9812565213 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=31961">Place hold on <em>Radiation defect engineering /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=31961</guid> </item> <item> <title> Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A. / </title> <dc:identifier>ISBN:9781558993426 | 1558993428</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67602</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558993428.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, Pa. : Materials Research Society, 1997 .<br /> xix, 727 p. : 24 cm..<br /> 9781558993426 | 1558993428 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=67602">Place hold on <em>Materials modification and synthesis by ion beam processing :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67602</guid> </item> <item> <title> Materials modification and growth using Ion beams : symposium held April 21-23, 1987, Anaheim, California, U.S.A. / </title> <dc:identifier>ISBN:9780931837609 | 093183760X</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49480</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/093183760X.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, Pa. : Materials Research Society, 1987 .<br /> xix, 415 p. : , &quot;Papers presented at the symposium on Materials Modification and Growth Using Ion Beams held April 21-23, 1987, as part of the MRS meeting in Anaheim, CA&quot; 24 cm..<br /> 9780931837609 | 093183760X </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=49480">Place hold on <em>Materials modification and growth using Ion beams :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=49480</guid> </item> <item> <title> In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / </title> <dc:identifier>ISBN:9781558990463 | 1558990461</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=65012</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558990461.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Pittsburgh, PA : Materials Research Society, 1990 .<br /> xi, 496 p. : 24 cm..<br /> 9781558990463 | 1558990461 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=65012">Place hold on <em>In-situ patterning :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=65012</guid> </item> <item> <title> High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:9781558997592 | 1558997598</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=68384</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558997598.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Warrendale, PA : Materials Research Society, 2004 .<br /> xii, 304 p. : 24 cm..<br /> 9781558997592 | 1558997598 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=68384">Place hold on <em>High-mobility group-IV materials and devices :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=68384</guid> </item> <item> <title> Doping engineering for front-end processing : symposium held March 25-27, 2008, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:9781605110400</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67690</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/160511040X.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Warrendale, PA : Materials Research Society, 2008 .<br /> xi, 319 p. : 24 cm..<br /> 9781605110400 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=67690">Place hold on <em>Doping engineering for front-end processing :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67690</guid> </item> <item> <title> Doping engineering for device fabrication : symposium held April 18-19, 2006, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:9781558998681</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=72802</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1558998683.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> Warrendale, Pa. : Materials Research Society, 2006 .<br /> xi, 213 p. : 24 cm..<br /> 9781558998681 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=72802">Place hold on <em>Doping engineering for device fabrication :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=72802</guid> </item> <item> <title> Doping : properties, mechanisms and applications / </title> <dc:identifier>ISBN:9781626180970 (hardcover) | 1626180970 (hardcover)</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=78413</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1626180970.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> [Hauppauge] New York : Nova Publishers, 2013 .<br /> x, 318 p. : 27 cm..<br /> 9781626180970 (hardcover) | 1626180970 (hardcover) </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=78413">Place hold on <em>Doping :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=78413</guid> </item> <item> <title> Dopants and defects in semiconductors / </title> <dc:identifier>ISBN:9781439831526</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67779</link> <description> <![CDATA[ <img src="https://images-na.ssl-images-amazon.com/images/P/1439831521.01.TZZZZZZZ.jpg" alt="" /> ]]> <![CDATA[ <p> By McCluskey, Matthew D..<br /> Boca Raton, FL : Taylor &amp; Francis, 2012 .<br /> xx, 370 p. : 26 cm..<br /> 9781439831526 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=67779">Place hold on <em>Dopants and defects in semiconductors /</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=67779</guid> </item> <item> <title> Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A. / </title> <dc:identifier>ISBN:978155899373 | 1558993738</dc:identifier> <link>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66948</link> <description> <![CDATA[ <p> Pittsburgh, PA : Materials Research Society, 1997 .<br /> xv, 541 p. : 24 cm..<br /> 978155899373 | 1558993738 </p> ]]> <![CDATA[ <p> <a href="https://efind.ump.edu.my/cgi-bin/koha/opac-reserve.pl?biblionumber=66948">Place hold on <em>Defects and diffusion in silicon processing :</em></a> </p> ]]> </description> <guid>https://efind.ump.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=66948</guid> </item> </channel> </rss>
