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|---|---|---|---|
| 001 | vtls000050785 | ||
| 003 | KUKTEM | ||
| 005 | 20251117141451.0 | ||
| 006 | m f d | ||
| 007 | cr cnu---unuuu | ||
| 008 | 110110t2009 nyua fob 001 0 eng d | ||
| 020 | _a9781607416753 (electronic bk.) | ||
| 020 | _a1607416751 (electronic bk.) | ||
| 020 | _a9781604564518 (hardcover) | ||
| 020 | _a1604564512 (hardcover) | ||
| 039 | 9 |
_a201107140022 _bVLOAD _c201105131224 _dfauzi _y201101101218 _zida _wimport 2.mrk _x342 |
|
| 040 | _aUMP | ||
| 090 | _aTK7874.53 .H36 2009 | ||
| 100 | 1 | _aHübner, René | |
| 245 | 1 | 0 |
_aAdvanced Ta-based diffusion barriers for Cu interconnects _h[electronic resource] / _cRené Hübner |
| 260 |
_aNew York : _bNova Science Publishers, _cc2009 |
||
| 300 |
_a1 online resource (xvi, 366 p.) : _bill. |
||
| 500 | _aDescription based on print version record | ||
| 504 | _aIncludes bibliographical references (p. [81]-94) and index | ||
| 538 | _aMode of access: Internet | ||
| 650 | 0 | _aInterconnects (Integrated circuit technology) | |
| 650 | 0 | _aIntegrated circuits | |
| 650 | 0 | _aElectrodiffusion | |
| 856 | 4 | 0 |
_3NetLibrary _uhttp://www.netlibrary.com.libraryumpsa.idm.oclc.org/urlapi.asp?action=summary&v=1&bookid=281179 |
| 999 |
_aVIRTUA40 _c17616 _d17622 |
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