000			00800nam a2200241 4500
001			vtls000009278
003			KUKTEM
005			20251117142239.0
008			060606t2004 xxu gr |0 1 0|eng |
020			_a0071445633
039		9	_a201107131741 _bVLOAD _c200908141115 _dVLOAD _c200908141047 _dVLOAD _c200908131547 _dVLOAD _y200606141143 _zVLOAD
040			_aUMP
090			_aTK7872.M3 E96 2005
100			_aEynon, Benjamin G.
245	0	0	_aPhotomask fabrication technology / _c Benjamin C. Eynon, Jr., Banqiu Wu
260			_aNew York: _b McGraw-Hill, _c 2005
300			_axi, 571 p.: _b ill.; _c 24 cm.
504			_aIncludes bibliographical references and index
650	0	0	_aIntegrated circuits _xMasks
650	0	0	_aMasks (Electronics)
650	0	0	_aMicrolithography
700	1	2	_aWu, Banqiu
999			_c25387 _d25393