000 01073nam a2200265 a 4500
001 vtls000009395
003 KUKTEM
005 20260820082709.0
008 060606t2002 nyua f 001 0 eng d
020 _a0824708016
039 9 _a201204191155
_bida
_c201107131911
_dVLOAD
_c200908141314
_dVLOAD
_c200908141246
_dVLOAD
_y200606141144
_zVLOAD
040 _aUMP
090 _aTP155.7 .L89 2002
100 1 _aLuyben, William L.
245 1 0 _aPlantwide dynamic simulators in chemical processing and control /
_cWilliam L. Luyben
260 _aNew York :
_bMarcel Dekker,
_c2002
300 _aix, 429 p. :
_bill. ;
_c24 cm. +
_e1 CD-ROM
440 0 _aChemical industries ;
_vv. 87
500 _aIncludes index
538 _aSystem requirements: IBM PC or compatibles; software requires HYSYS or Aspen Dynamics; figures require Microsoft Word
650 0 _aChemical processes
_xComputer simulation
650 0 _aChemical process control
_xComputer simulation
999 _aVIRTUA40
_c33352
_d33358
999 _aVTLSSORT0080*0200*0400*0900*1000*2450*2600*3000*4400*5000*5380*6500*6501*9991
942 0 0 _01