000 00981nam a2200241 a 4500
001 vtls000029846
003 KUKTEM
005 20251117145329.0
008 080630s2008 flua b 001 0 eng
020 _a1420066870 (alk. paper)
020 _a9781420066876 (alk. paper)
039 9 _a201107132119
_bVLOAD
_c201012061442
_dida
_c200908141604
_dVLOAD
_c200908141536
_dVLOAD
_y200806301628
_znorsaini
040 _aUMP
090 _aTK7871.96.B55 F33 2008
245 0 0 _aFabrication of SiGe HBT BiCMOS technology /
_cedited by John D. Cressler
260 _aBoca Raton, FL :
_bCRC Press,
_cc2008
300 _a1 v. (various pagings) :
_bill. ;
_c27 cm.
500 _aIncludes bibliographical references and index
650 0 _aBipolar transistors
_xDesign and construction
650 0 _aMetal oxide semiconductors, Complementary
_xDesign and construction
700 1 _aCressler, John D.
999 _aVIRTUA40
_c44029
_d44035
999 _aVTLSSORT0080*0200*0201*0400*0900*2450*2600*3000*5000*6500*6501*7000*9991