| 000 | 00929nam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | vtls000019770 | ||
| 003 | KUKTEM | ||
| 005 | 20251117150433.0 | ||
| 008 | 070521 000 0 eng d | ||
| 020 | _a1402012489 | ||
| 039 | 9 |
_a201107131742 _bVLOAD _c200908141117 _dVLOAD _c200908141049 _dVLOAD _c200908131548 _dVLOAD _y200705211018 _zfarina |
|
| 040 | _aUMP | ||
| 090 | _aTS695 .D63 2003 | ||
| 100 | 1 | _aDobkin, Daniel Mark | |
| 245 | 1 | 0 |
_aPrinciples of chemical vapor deposition : _bwhat's going on inside the reactor / _cby Daniel M. Dobkin and Michael K. Zuraw |
| 260 |
_aBoston : _bKluwer Academic Publishers, _c2003 |
||
| 300 |
_axi, 273 p. : _bill. ; _c25 cm. |
||
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aVapor-plating | |
| 650 | 0 | _aRefractory coating | |
| 700 | 1 | _aZuraw, Michael K. | |
| 999 |
_aVIRTUA _c58340 _d58346 |
||
| 999 | _aVTLSSORT0080*0200*0900*1000*2450*2600*3000*5040*6500*6501*7000*9991 | ||