| 000 | 01122nam a2200301 a 4500 | ||
|---|---|---|---|
| 001 | vtls000052763 | ||
| 003 | KUKTEM | ||
| 005 | 20251117150456.0 | ||
| 008 | 110411t2010 njua f 001 0 eng d | ||
| 020 | _a9780470596975 | ||
| 020 | _a047059697X | ||
| 039 | 9 |
_a201111021342 _bida _c201110131150 _dasmadi _c201107140044 _dVLOAD _y201104111604 _zsafura |
|
| 040 | _aUMP | ||
| 090 | _aTK7872.M3 M39 2010 | ||
| 100 | 1 | _aMa, Xu | |
| 245 | 1 | 0 |
_aComputational lithography / _cXu Ma and Gonzalo R. Arce |
| 260 |
_aHoboken, N.J. : _bWiley, _cc2010 |
||
| 300 |
_axv, 226 p. : _bill. ; _c25 cm. |
||
| 490 | 0 | _aWiley series in pure and applied optics | |
| 504 | _aIncludes bibliographical references (p. 217-222) and index | ||
| 650 | 0 |
_aMicrolithography _xMathematics |
|
| 650 | 0 |
_aIntegrated circuits _xDesign and construction _xMathematics |
|
| 650 | 0 |
_aPhotolithography _xMathematics |
|
| 650 | 0 |
_aSemiconductors _xEtching _xMathematics |
|
| 650 | 0 | _aResolution (Optics) | |
| 700 | 1 | _aArce, Gonzalo R. | |
| 999 |
_aVIRTUA40 _c59097 _d59103 |
||
| 999 | _aVTLSSORT0080*0200*0201*0400*0900*1000*2450*2600*3000*4900*5040*6500*6501*6502*6503*6504*7000*9991 | ||