| 000 | 00859nam a2200253 a 4500 | ||
|---|---|---|---|
| 001 | vtls000056089 | ||
| 003 | KUKTEM | ||
| 005 | 20251117150519.0 | ||
| 008 | 111118t2011 enka f 001 0 eng d | ||
| 020 | _a9781848212312 | ||
| 020 | _a1848212313 | ||
| 039 | 9 |
_a201201311243 _basmadi _y201111181143 _zsri |
|
| 040 | _aUMP | ||
| 090 | _aTK7871.85 .S55 2011 | ||
| 245 | 0 | 0 |
_aSilicon technologies : _bion implantation and thermal treatment / _cedited by Annie Baudrant |
| 260 |
_aLondon : _bWiley, _c2011 |
||
| 300 |
_axvii, 337 p. : _bill. ; _c24 cm. |
||
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aSemiconductor doping | |
| 650 | 0 | _aIon implantation | |
| 650 | 0 |
_aSemiconductors _xHeat treatment |
|
| 700 | 1 | _aBaudrant, Annie | |
| 999 |
_aVIRTUA40 _c59874 _d59880 |
||
| 999 | _aVTLSSORT0080*0200*0201*0400*0900*2450*2600*3000*5040*6500*6501*6502*7000*9991 | ||