000 01522nam a2200313 a 4500
001 vtls000062047
003 KUKTEM
005 20251125093745.0
008 120615t2007 paudao f 001 0 eng d
020 _a9781558999503
020 _a1558999507
039 9 _a201304181017
_bhuda
_y201206151511
_zsafura
040 _aUMP
090 _aTK7874.53 .S96 2007
111 2 _aSymposium B, "Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics"
_d(2007 :
_cSan Francisco, Calif.)
245 1 0 _aMaterials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics :
_bsymposium held April 10-12, 2007, San Francisco, California, U.S.A. /
_ceditors: Qinghuang Lin ... [et al.]
260 _aWarrendale, PA :
_bMaterials Research Society,
_c2007
300 _axiv, 338 p. :
_bill. ;
_c24 cm.
490 1 _aMaterials Research Society symposium proceedings ;
_vv. 990
504 _aIncludes bibliographical references and indexes
650 0 _aInterconnects (Integrated circuit technology)
_vCongresses
650 0 _aIntegrated circuits
_xVery large scale integration
_vCongresses
650 0 _aMicroelectronics
_vCongresses
650 0 _aNanoelectronics
_vCongresses
650 0 _aMaterials
_vCongresses
700 1 _aLin, Qinghuang
830 0 _aMaterials Research Society symposia proceedings ;
_vv. 990
999 _aVIRTUA40
_c67889
_d67895
999 _aVTLSSORT0080*0200*0201*0400*0900*1110*2450*2600*3000*4900*5040*6500*6501*6502*6503*6504*7000*8300*9992