| 000 | 00985nam a2200277 a 4500 | ||
|---|---|---|---|
| 001 | vtls000093134 | ||
| 003 | KUKTEM | ||
| 005 | 20251125103108.0 | ||
| 008 | 151212t2015 flua f 001 0 eng d | ||
| 020 | _a9781466517288 (hbk.) | ||
| 039 | 9 |
_a201602111522 _baida _y201512121141 _zfaiz |
|
| 040 | _aUMP | ||
| 090 | _aTA455 .P58 N35 2015 | ||
| 100 | 1 | _aNakamura, Kenichiro | |
| 245 | 1 | 0 |
_aPhotopolymers : _bphotoresist materials, processes, and applications / _cKenichiro Nakamura |
| 260 |
_aBoca Raton, FL : _bCRC Press, _cc2015 |
||
| 300 |
_aix, 179 p. : _bill. ; _c24 cm. |
||
| 490 | 0 |
_aOptics and photonics ; _vv. 10 |
|
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 | _aPhotopolymers | |
| 650 | 0 | _aPhotoresists | |
| 650 | 0 | _aPhotopolymerization | |
| 650 | 0 |
_aPhotopolymers _xIndustrial applications |
|
| 650 | 0 |
_aMicroelectronics _xMaterials |
|
| 999 |
_aVIRTUA40 _c82172 _d82178 |
||
| 999 | _aVTLSSORT0080*0200*0400*0900*1000*2450*2600*3000*4900*5040*6500*6501*6502*6503*6504*9992 | ||