Normal view MARC view ISBD view

Advanced Ta-based diffusion barriers for Cu interconnects

Hübner, René

Advanced Ta-based diffusion barriers for Cu interconnects [electronic resource] / René Hübner - New York : Nova Science Publishers, c2009 - 1 online resource (xvi, 366 p.) : ill.

Description based on print version record

Includes bibliographical references (p. [81]-94) and index

Mode of access: Internet

ISBN: 9781607416753 (electronic bk.) 1607416751 (electronic bk.) 9781604564518 (hardcover) 1604564512 (hardcover)

Subjects--Topical Terms:
Interconnects (Integrated circuit technology)
Integrated circuits
Electrodiffusion

Print
Add to your cart (remove)
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)