Advanced Ta-based diffusion barriers for Cu interconnects [electronic resource] / René Hübner

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Material type: Text

TextPublication details: New York : Nova Science Publishers, c2009Description: 1 online resource (xvi, 366 p.) : illISBN:

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Holdings
Item type	Current library	Call number	Copy number	Status	Date due	Barcode
E-book	UMPLIB GAMBANG	TK7874.53 .H36 2009 (Browse shelf(Opens below))	1	Not for loan		0000056845

Description based on print version record

Includes bibliographical references (p. [81]-94) and index

Mode of access: Internet