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Photomask fabrication technology /

Eynon, Benjamin G.

Photomask fabrication technology / Benjamin C. Eynon, Jr., Banqiu Wu - New York: McGraw-Hill, 2005 - xi, 571 p.: ill.; 24 cm.

Includes bibliographical references and index

ISBN: 0071445633

Subjects--Topical Terms:
Integrated circuits--Masks
Masks (Electronics)
Microlithography

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