Photomask fabrication technology / Benjamin C. Eynon, Jr., Banqiu Wu

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Material type: Text

TextPublication details: New York: McGraw-Hill, 2005Description: xi, 571 p.: ill.; 24 cmISBN:

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Holdings
Item type	Current library	Call number	Status	Date due	Barcode
Open Shelf	UMPLIB PEKAN	TK7872.M3 E96 2005 (Browse shelf(Opens below))	Available		0000012516

Includes bibliographical references and index