Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : symposium held April 10-12, 2007, San Francisco, California, U.S.A. /
Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : symposium held April 10-12, 2007, San Francisco, California, U.S.A. /
editors: Qinghuang Lin ... [et al.]
- Warrendale, PA : Materials Research Society, 2007
- xiv, 338 p. : ill. ; 24 cm.
- Materials Research Society symposium proceedings ; v. 990 .
- Materials Research Society symposia proceedings ; v. 990 .
Includes bibliographical references and indexes
9781558999503 1558999507
Interconnects (Integrated circuit technology)--Congresses
Integrated circuits--Very large scale integration--Congresses
Microelectronics--Congresses
Nanoelectronics--Congresses
Materials--Congresses
Includes bibliographical references and indexes
9781558999503 1558999507
Interconnects (Integrated circuit technology)--Congresses
Integrated circuits--Very large scale integration--Congresses
Microelectronics--Congresses
Nanoelectronics--Congresses
Materials--Congresses