Principles of chemical vapor deposition : what's going on inside the reactor / by Daniel M. Dobkin and Michael K. Zuraw

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Material type: Text

TextPublication details: Boston : Kluwer Academic Publishers, 2003Description: xi, 273 p. : ill. ; 25 cmISBN:

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Holdings
Item type	Current library	Call number	Copy number	Status	Date due	Barcode
Open Shelf	UMPLIB GAMBANG	TS695 .D63 2003 (Browse shelf(Opens below))	1	Available		0000022906

Includes bibliographical references and index