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		Photomask fabrication technology / Benjamin C. Eynon, Jr., Banqiu Wu by Eynon, Benjamin G Wu, Banqiu Material type: Text; Literary form: Not fiction ; Audience: General; Publication details: New York: McGraw-Hill, 2005 Availability: Items available for loan: UMPLIB PEKAN (1)Call number: TK7872.M3 E96 2005. Place hold Log in to add tags Add to cart (remove)
		Materials development for direct write technologies : symposium held April 24-26, 2000, San Francisco, California, U.S.A. / editors, Douglas B. Chrisey ... [et al.] by Chrisey, Douglas B Series: Materials Research Society symposium proceedings ; v. 624 Material type: Text; Format: print ; Literary form: Not fiction ; Audience: Specialized; Publication details: Warrendale, Pa. : Materials Research Society, 2001 Availability: Items available for loan: UMPLIB PEKAN (1)Call number: TK7871 .M38 2001. Place hold Log in to add tags Add to cart (remove)
		Handbook of photomask manufacturing technology / edited by Syed Rizvi by Rizvi, Syed Material type: Text Publication details: Boca Raton: Taylor & Francis, 2005 Online resources: URL link Availability: Items available for reference: UMPLIB PEKAN: Not for loan (1)Call number: TK7872.M3 H36 2005 r. Log in to add tags Add to cart (remove)

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